Organometallic Precursors to Vanadium and Titanium Carbonitride

ABSTRACTWe repon on the syntheses, structural and thermoanalytical studies of two titanium complexes CpTiCl2N(SiMe3)2 and FTi[N(Sime3)2]3 and one vanadium complex V(NEt2)4. CpTiCl2N(SiMe3)2 has been used in a hot wall CVD reactor as a precursor to titanium nitride. Thin films of typically 1 XPS in thickness have been deposited at 600°C on glass, silicon and tool steel. XPS analyses of the deposits show titanium carbonitride to be formed. The new FTi[N(Sime3)2]3 complex can also be used as a precursor to titanium nitride. V(NEt2>4 led at 500°C to the deposition of vanadium carbonitride characterized by XPS analysis. Films tended to contain excess free carbon.

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Titanium Nitride Thin Films: Properties and Apcvd Synthesis Using Organometallic Precursors

MRS Proceedings ◽

10.1557/proc-168-357 ◽

1989 ◽

Vol 168 ◽

Cited By ~ 29

Author(s):

Renaud M. Fix ◽

Roy G. Gordon ◽

David M. Hoffman

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Photoelectron Spectroscopy ◽

Rutherford Backscattering Spectrometry ◽

Vitreous Carbon ◽

Low Temperature Synthesis ◽

Ammonia Gas ◽

Plastic Substrates ◽

Tin Coatings ◽

Organometallic Precursors

AbstractA novel process for the low temperature synthesis of titanium nitride thin films by APCVD is described. TiN coatings containing less than one atom percent of carbon and oxygen were deposited at 200 °C on silicon, vitreous carbon, glass, stainless steel and plastic substrates using Ti(Nme2)4 and ammonia gas as precursors. The films were characterized by Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy.

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Bidirectional properties of TiC, TiN and TiNC thin films deposited by radio frequency magnetron sputtering

Bio-Medical Materials and Engineering ◽

10.3233/bme-201134 ◽

2020 ◽

pp. 1-11

Author(s):

Sofiane Sedira ◽

Bilel Mendaci

Keyword(s):

Thin Films ◽

Corrosion Resistance ◽

Optical Properties ◽

Titanium Carbide ◽

Titanium Nitride ◽

Electrochemical Impedance ◽

Corrosion Behaviour ◽

Titanium Carbonitride ◽

Photoelectric Properties ◽

Vis Spectroscopy

BACKGROUND: Titanium nitride (TiN), titanium carbide (TiC) and titanium carbonitride (TiNC) thin films show promising practical applications due to their photoelectric properties and corrosion behaviour. OBJECTIVE: In this work, we investigated the factors which may affect the optical properties and the corrosion behaviour of these coatings. METHODS: The titanium coatings were carried out by sputtering using the target of Ti6Al4V (purity 99.96%) with different N2, CH4 and Ar partial pressures. XRD, FTIR, Raman and SEM with EDX studies show the formation of titanium nitride, titanium carbide coatings. Uv-vis spectroscopy was carried out to estimate the optical properties using the numerical Swanepoel method. Potentiodynamic polarization studies in Hank’s solution show that the corrosion resistance is found to be in the order of C-TiN(2) > C-TiN(1) > TiN > TiC. RESULTS: A high protective efficiency was determined (60%) when comparing TiNC(2) and TiC corrosion current densities, which confirms the lower corrosion velocity and the higher passivation stability of the coatings composed with TiN and TiC phases. Electrochemical impedance spectroscopy studies show that the Rct increases in the following order: TiC < TiN < C-TiN(1) < C-TiN(2), highlighting the fact that C-TiN(2) coating has the higher corrosion resistance.

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Characterisation of Titanium Nitride Thin Films Deposited by Cathodic Arc Plasma Technique on AISI D6 Tool Steel

Advanced Powder Technology IV - Materials Science Forum ◽

10.4028/0-87849-984-9.717 ◽

2005 ◽

pp. 717-721

Author(s):

R.A. Vieira ◽

Maria Carmo Andrade Nono

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Tool Steel ◽

Arc Plasma ◽

Plasma Technique ◽

Cathodic Arc

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GLANCING INCIDENCE X-RAY STUDIES OF TITANIUM NITRIDE THIN FILMS USING A NEW MULTIPURPOSE LABORATORY SPECTROMETER

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989716 ◽

1989 ◽

Vol 50 (C7) ◽

pp. C7-169-C7-173

Author(s):

R.C BUSCHERT ◽

P. N. GIBSON ◽

W. GISSLER ◽

J. HAUPT ◽

T. A. CRABB

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

X Ray

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Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

Materials Letters ◽

10.1016/j.matlet.2016.08.147 ◽

2016 ◽

Vol 185 ◽

pp. 295-298 ◽

Cited By ~ 10

Author(s):

Lin-Ao Zhang ◽

Hao-Nan Liu ◽

Xiao-Xia Suo ◽

Shuo Tong ◽

Ying-Lan Li ◽

...

Keyword(s):

Thin Films ◽

Titanium Nitride ◽

Ion Beam ◽

Ion Beam Assisted Deposition

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Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01079 ◽

2021 ◽

Vol 3 (2) ◽

pp. 999-1005

Author(s):

Hyeok Jae Lee ◽

Jin Ha Hwang ◽

Ji-Yong Park ◽

Sang Woon Lee

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Titanium Nitride ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Route ◽

Layer Deposition

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Friction and Wear Behavior of Silicon Carbonitride Processed From the Polymer-Derived Ceramic Route

World Tribology Congress III, Volume 2 ◽

10.1115/wtc2005-64022 ◽

2005 ◽

Cited By ~ 2

Author(s):

Tsali Cross ◽

Somuri Prasad ◽

Rishi Raj

Keyword(s):

Thin Film ◽

Thin Films ◽

Friction And Wear ◽

Wear Behavior ◽

Silicon Carbonitride ◽

Linear Wear ◽

Polymer Derived Ceramic ◽

Organometallic Precursors ◽

Future Work ◽

Contact Pressures

Polymer derived ceramics (PDC’s) are processed from liquid organometallic precursors by cross-linking the polymers into infusible solids, followed by controlled pyrolysis. No previous work regarding their tribology has been reported. Further, the synthesis of PDC’s as thin films, and the role that the nanostructure plays on the mechanical properties has not been reported. The objective of this research was to evaluate the fundamental tribological behavior of polymer derived SiCN in both bulk and thin film form. Friction and wear evaluations were made on bulk materials and thin films using a Si3N4 ballon-disk linear wear tester at various contact pressures and in different environments that contained various amounts of humidity. The micro/nanostructure was characterized by FTIR, microRaman, and scanning electron microscopy. Bulk SiCN gave a low friction coefficient and good wear resistance in humid environments but showed significant fracture and gouging in dry environments at higher contact pressures. Although there is ambiguity regarding the tribology of the thin films there seems to be a dependence upon the nitrogen content within the materials derived from the polymeric stage. The future work will focus on optimizing processing conditions of thin films and investigating the role that nitrogen plays in both bulk and thin film SiCN materials.

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