Influence of Deposition Parameters on the Properties of Nanocomposite Coatings Prepared by Cathodic Arc Evaporation

2016 ◽  
Vol 368 ◽  
pp. 77-81
Author(s):  
Miroslav Béger ◽  
Jozef Sondor ◽  
Martin Sahul ◽  
Paulína Zacková ◽  
Marián Haršáni ◽  
...  
Keyword(s):  
Residual Stresses ◽  
Bias Voltage ◽  
Deposition Process ◽  
Gas Pressure ◽  
Nanocomposite Coatings ◽  
Evaporation Process ◽  
Deposition Parameters ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties

Structure, morphology and mechanical properties of AlCrN coatings obtained by the method of cathodic arc evaporation

2018 ◽  
Vol 23 (2) ◽  
pp. 61-69
Author(s):  
Adam Gilewicz ◽  
Roman Jędrzejewski ◽  
Piotr Myśliński ◽  
Bogdan Warcholiński
Keyword(s):  
Deposition Rate ◽  
Bias Voltage ◽  
Roughness Parameter ◽  
Nitrogen Pressure ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Substrate Bias Voltage ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

CrAlN coatings have been formed on steel substrates (HS6-5-2) using cathodic arc evaporation. The influence of nitrogen pres-sure and substrate bias voltage on the properties of CrAlN coatings formed from Al80Cr20 cathode, such as: chemical and phase composition of the coatings, their surface morphology, deposition rate, hardness and adhesion to the substrate have been investigated. It has been determined that the rate of the deposition of coatings in the nitrogen atmosphere with the pressure of 3 Pa is the highest and that with the increase of the negative bias voltage of the substrate the deposition rate decreases. The roughness parameter Ra of the coating surface decreases as the nitrogen pressure increases during their formation. Presumably, this is related to the reduction of the amount of macroparticles on the surface of the coating. The hardness of the coatings (taking into account the measurement uncertainty) is independent of the nitrogen pressure, but it increases with the increase of the negative bias voltage of the substrate. The adhesion of the coating increases with the increase of the nitrogen pressure to 3–4 Pa, and then it decreases. The increase in the negative bias voltage of the substrate during the formation of the coating deteriorates its adhesion to the substrate.

Observation of Coating-Substrate Adhesion of Nanocomposite Hard Coating with Respect to the Deposition Parameters and Surface Finishing of Cemented Carbide Substrate

2020 ◽  
Vol 990 ◽  
pp. 231-238
Author(s):  
Tomas Vopat ◽  
Martin Sahul ◽  
Marián Haršáni ◽  
Tomáš Zlámal ◽  
Ondrej Vortel
Keyword(s):  
Bias Voltage ◽  
Indentation Test ◽  
Hard Coatings ◽  
Surface Finishing ◽  
Substrate Bias Voltage ◽  
Hardness Tester ◽  
Substrate Adhesion ◽  
Deposition Parameters ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation

The paper deals with the issue of coating and surface finishing with edge preparation prior to the coating. Nanocomposite AlCrSiN hard coatings were deposited on WC-Co substrates with a negative substrate bias voltage in range of-80 to-120 V using cathodic arc evaporation system. The effect of variation in the bias voltage on the coating-substrate adhesion and nanohardness was investigated. The maximum nanohardness of coating was 37.7 ± 1.5 GPa with the good coating-substrate adhesion. Static Mercedes indentation test was performed on a Rockwell-type hardness tester. The indents were studied by scanning electron microscope to evaluate the coating-substrate adhesion. The H to E ratio that represents resistance to the plastic deformation was determined. The influence of surface roughness and time of used surface finishing methods on the coating-substrate adhesion was also investigated.

Deposition process and characterization of chromium-carbon coatings produced by direct sputtering of a magnetron chromium carbide target

1994 ◽  
Vol 9 (7) ◽  
pp. 1820-1828 ◽  
Author(s):  
N. Maréchal ◽  
E. Quesnel ◽  
Y. Pauleau
Keyword(s):  
Electrical Resistivity ◽  
Residual Stresses ◽  
Chromium Carbide ◽  
Bias Voltage ◽  
Bulk Material ◽  
Deposition Process ◽  
Gas Pressure ◽  
Atom Number ◽  
Carbon Coatings ◽  
Self Bias

Chromium-carbon coatings have been deposited on various substrates by direct sputtering of a chromium carbide, Cr3C2, target in pure argon atmosphere. The composition of coatings determined by Rutherford backscattering spectroscopy and the deposition rate were investigated as functions of the sputtering gas pressure and self-bias voltage applied to substrates. The atom number ratio C/Cr in the coatings was equal to 0.7 regardless of the deposition conditions investigated. Oxygen and argon atoms were the major impurities incorporated in the amorphous coatings. Oxygen-free Cr-C coatings were prepared at low argon pressures or on substrates biased to a voltage in the range −100 to −320 V. The Cr-C coatings deposited on biased substrates contained less than 2 at. % of argon. The morphological features of Cr-C coatings examined by scanning electron microscopy were also dependent on the sputtering gas pressure and bias voltage of substrates. Fully dense structures were observed for coatings deposited at low argon pressures or on biased substrates. The electrical resistivity of Cr-C coatings was extremely dependent on the concentration of oxygen atoms incorporated in the coatings. Oxygen-free Cr-C coatings exhibited electrical resistivity values as low as 120 μΩ cm, i.e., less than twice the bulk resistivity of Cr3C2. The residual stresses in the coatings and microhardness of the deposited material were also investigated as functions of the deposition parameters. Tensile residual stresses were lower than 0.8 GPa, and the maximum microhardness of coatings was about 13000 MPa, i.e., similar to that of the bulk material.

Interplay of microstructural features in Cr1−xAlxN and Cr1−x−yAlxSiyN nanocomposite coatings deposited by cathodic arc evaporation

2008 ◽  
Vol 202 (14) ◽  
pp. 3199-3207 ◽  
Author(s):  
M. Dopita ◽  
D. Rafaja ◽  
Ch. Wüstefeld ◽  
M. Růžička ◽  
V. Klemm ◽  
...  
Keyword(s):  
Nanocomposite Coatings ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc
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