The reflective optical multi-films with high damage thresholds are widely used in intense-light systems. Metasurfaces, which can manipulate light peculiarly, give a new approach to achieve highly reflective films by a single-layer configuration. In this study, reflective metasurfaces, composed of silicon nanoholes, are numerically investigated to achieve high damage thresholds. These nanoholes can confine the strongest electric field into the air zone, and, subsequently, the in-air electric field does not interact directly with silicon, attenuating the optothermal effect that causes damage. Firstly, the geometrical dependencies of silicon nanoholes’ reflectance and field distribution are investigated. Then, the excitation states of electric/magnetic dipoles in nanostructures are analyzed to explain the electromagnetic mechanism. Furthermore, the reflection dependences of the nanostructures on wavelength and incident angle are investigated. Finally, for a typical reflective meta-film, some optothermal simulations are conducted, in which a maximum laser density of 0.27 W/µm2 can be handled. The study provides an approach to improve the laser damage threshold of reflective nanofilms, which can be exploited in many intense-light applications.