2020 International Workshop on Advanced Patterning Solutions (IWAPS)
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Published By IEEE

9781728175775
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Machine Learning Virtual SEM Metrology

2020 ◽  
Author(s):  
Yan Yan ◽  
Xuelong Shi ◽  
Tao Zhou ◽  
Bowen Xu ◽  
Chen Li ◽  
...  
Keyword(s):  
Machine Learning

Photoresist for Extreme Ultraviolet Lithography

2020 ◽  
Author(s):  
Peipei Tao ◽  
Li Sheng ◽  
Qianqian Wang ◽  
Hao Cui ◽  
Xiaolin Wang ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Source Optimization under Thick Mask Model

2020 ◽  
Author(s):  
Yang Liu ◽  
Yiyu Sun ◽  
Yanqiu Li ◽  
Pengzhi Wei ◽  
Lihui Liu ◽  
...  

An effective method of contour extraction for SEM image based on DCNN

2020 ◽  
Author(s):  
Tao Zhou ◽  
Xuelong Shi ◽  
YanYan ◽  
Chen Li ◽  
Shoumian Chen ◽  
...  
Keyword(s):  
Contour Extraction ◽  
Sem Image

Real time process monitoring using diffraction-based overlay measurements from YieldStar

2020 ◽  
Author(s):  
Henry Chen ◽  
Jimmy Chang ◽  
Sheng-Tsung Tsao ◽  
Junjun Zhang ◽  
Jie Du ◽  
...  
Keyword(s):  
Real Time ◽  
Process Monitoring ◽  
Time Process

OPO Measurement Improvement in Advanced DRAM with Tunable Wavelength Imaging

2020 ◽  
Author(s):  
Yunsheng Xia ◽  
Rui Qin ◽  
Andy Lan ◽  
Joer Huang ◽  
Congcong Fan ◽  
...  
Keyword(s):  
Tunable Wavelength

Overlay mark sub structure design to improve the contrast

2020 ◽  
Author(s):  
Libin Zhang ◽  
Cong Lu ◽  
Yaobin Feng ◽  
Yayi Wei ◽  
Xiaojing Su ◽  
...  
Keyword(s):  
Structure Design
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