Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
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111

(FIVE YEARS 111)

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0

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Published By SPIE

9781510640559, 9781510640566

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Diagnosing and removing CD-SEM metrology artifacts

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2585311 ◽

2021 ◽

Author(s):

Chris A. Mack ◽

Gian F. Lorusso ◽

Christie Delvaux

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In-line Raman spectroscopy for stacked nanosheet device manufacturing

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2582181 ◽

2021 ◽

Author(s):

Daniel Schmidt ◽

Curtis Durfee ◽

Juntao Li ◽

Nicolas J. Loubet ◽

Aron Cepler ◽

...

Keyword(s):

Raman Spectroscopy

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Nanophotonics as computing machines

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2588629 ◽

2021 ◽

Author(s):

Nader Engheta

Keyword(s):

Computing Machines

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Identifying contributors to overlay variability using a model-less analysis method

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2584554 ◽

2021 ◽

Author(s):

Fatima Anis ◽

ROEL GRONHEID ◽

Dieter Dieter Van den Heuvel ◽

Franz Zach

Keyword(s):

Analysis Method

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Contour metrology accuracy assessment using TMU analysis

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2584617 ◽

2021 ◽

Author(s):

Nivea G. Schuch ◽

Mohamed Abaidi ◽

Thiago Figueiro ◽

Patrick Schiavone ◽

Matthew Sendelbach

Keyword(s):

Accuracy Assessment

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Study of further image performance improvement by spectral bandwidth for ArFi lithography lightsource

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2583731 ◽

2021 ◽

Author(s):

Takamitsu Komaki ◽

shinichi matsumoto ◽

koichi fujii ◽

takehiko tomonaga ◽

taku yamazaki ◽

...

Keyword(s):

Performance Improvement ◽

Spectral Bandwidth ◽

Image Performance

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A new metrology technique for defect inspection via coherent Fourier scatterometry using orbital angular momentum beams

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2584728 ◽

2021 ◽

Author(s):

Bin Wang ◽

Michael Tanksalvala ◽

Zhe Zhang ◽

Yuka Esashi ◽

Nicholas Jenkins ◽

...

Keyword(s):

Angular Momentum ◽

Orbital Angular Momentum ◽

Defect Inspection

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Defect characterization of 28 nm pitch EUV single patterning structures for iN5 node

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2584760 ◽

2021 ◽

Author(s):

Kaushik Sah ◽

Sayantan Das ◽

Andrew Cross ◽

Kay Peng ◽

Kha Tran ◽

...

Keyword(s):

Defect Characterization ◽

28 Nm

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Method to improve the overlay image contrast and optimize the sub-segmentation mark

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2583820 ◽

2021 ◽

Author(s):

Libin Zhang ◽

Cong Lu ◽

Yaobin Feng ◽

Yayi Wei

Keyword(s):

Image Contrast

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Automated extraction of critical dimension from SEM images with Weave

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV ◽

10.1117/12.2583900 ◽

2021 ◽

Author(s):

Leandro Medina ◽

Bryan Sundahl ◽

Roger T. Bonnecaze ◽

Meghali Chopra

Keyword(s):

Critical Dimension ◽

Automated Extraction ◽

Sem Images

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