Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

2021 ◽  
Vol 39 (6) ◽  
pp. 063402
Author(s):  
Wjatscheslaw Sakiew ◽  
Philippe Schwerdtner ◽  
Marco Jupé ◽  
Andreas Pflug ◽  
Detlev Ristau
Keyword(s):  
Ion Beam ◽  
Quality Parameters ◽  
Large Area ◽  
Ion Species ◽  
Process Productivity ◽  
Ta2o5 Layer

Large Area Surface Treatment by Ion Beam Technology

1996 ◽  
Vol 438 ◽  
Author(s):  
R. L. C. Wu ◽  
W. Lanter
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Polycrystalline Diamond ◽  
Carbon Films ◽  
Ultra High Vacuum ◽  
Diamond Like Carbon ◽  
Chemical Compositions ◽  
Rf Power ◽  
Large Area ◽  
Ion Energy

AbstractAn ultra high vacuum ion beam system, consisting of a 20 cm diameter Rf excilted (13.56 MHz) ion gun and a four-axis substrate scanner, has been used to modify large surfaces (up to 1000 cm2) of various materials, including; infrared windows, silicon nitride, polycrystalline diamond, 304 and 316 stainless steels, 440C and M50 steels, aluminum alloys, and polycarbonates; by depositing different chemical compositions of diamond-like carbon films. The influences of ion energy, Rf power, gas composition (H2/CH4 , Ar/CH4 and O2/CH4/H2), on the diamond-like carbon characteristics has been studied. Particular attention was focused on adhesion, environmental effects, IR(3–12 μm) transmission, coefficient of friction, and wear factors under spacelike environments of diamond-like carbon films on various substrates. A quadrupole mass spectrometer was utilized to monitor the ion beam composition for quality control and process optimization.

Formation of a large-area uniform ion beam using multipole magnets in the TIARA cyclotron

2011 ◽  
Vol 642 (1) ◽  
pp. 10-17 ◽  
Author(s):  
Yosuke Yuri ◽  
Tomohisa Ishizaka ◽  
Takahiro Yuyama ◽  
Ikuo Ishibori ◽  
Susumu Okumura ◽  
...  
Keyword(s):  
Ion Beam ◽  
Large Area

Fabrication of large area nanogap electrodes for sensing applications

2013 ◽  
Vol 1530 ◽  
Author(s):  
A. Bendavid ◽  
L. Wieczorek ◽  
R. Chai ◽  
J. S. Cooper ◽  
B. Raguse
Keyword(s):  
Large Scale ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Current ◽  
Fabrication Method ◽  
Large Area ◽  
Sensor Applications ◽  
Sensing Applications ◽  
Lift Off ◽  
Nanogap Electrodes

ABSTRACTA large area nanogap electrode fabrication method combinig conventional lithography patterning with the of focused ion beam (FIB) is presented. Lithography and a lift-off process were used to pattern 50 nm thick platinum pads having an area of 300 μm × 300 μm. A range of 30-300 nm wide nanogaps (length from 300 μm to 10 mm ) were then etched using an FIB of Ga+ at an acceleration voltage of 30 kV at various beam currents. An investigation of Ga+ beam current ranging between 1-50 pA was undertaken to optimise the process for the current fabrication method. In this study, we used Monte Carlo simulation to calculate the damage depth in various materials by the Ga+. Calculation of the recoil cascades of the substrate atoms are also presented. The nanogap electrodes fabricated in this study were found to have empty gap resistances exceeding several hundred MΩ. A comparison of the gap length versus electrical resistance on glass substrates is presented. The results thus outline some important issues in low-conductance measurements. The proposed nanogap fabrication method can be extended to various sensor applications, such as chemical sensing, that employ the nanogap platform. This method may be used as a prototype technique for large-scale fabrication due to its simple, fast and reliable features.

Optimization of large area YBa2Cu3O7−x films by single target ion beam sputtering

1991 ◽  
Vol 185-189 ◽  
pp. 2563-2564 ◽  
Author(s):  
A. Gauzzi ◽  
M.L. Lucia ◽  
M. Affronte ◽  
D. Pavuna
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Large Area ◽  
Single Target ◽  
Beam Sputtering

scholarly journals Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

2019 ◽  
Vol 8 (3-4) ◽  
pp. 233-240
Author(s):  
Roberto Fallica
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Talbot Effect ◽  
Large Area ◽  
Projection Lithography ◽  
Main Technique ◽  
Direct Laser ◽  
The Cost ◽  
Diffraction Effects

Abstract There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

Dependene of Focused Ion Beam Intensity Profile on Ion Species at Several Orders of Magnitude below the Peak Intensity

1987 ◽  
Vol 26 (Part 2, No. 2) ◽  
pp. L145-L147 ◽  
Author(s):  
Eizo Miyauchi ◽  
Hiroshi Arimoto ◽  
Tetsuo Morita ◽  
Hisao Hashimoto
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Intensity Profile ◽  
Beam Intensity ◽  
Peak Intensity ◽  
Ion Species

Structurally Controlled Large-Area 10 nm Pitch Graphene Nanomesh by Focused Helium Ion Beam Milling

2018 ◽  
Vol 10 (12) ◽  
pp. 10362-10368 ◽  
Author(s):  
Marek Edward Schmidt ◽  
Takuya Iwasaki ◽  
Manoharan Muruganathan ◽  
Mayeesha Haque ◽  
Huynh Van Ngoc ◽  
...  
Keyword(s):  
Ion Beam ◽  
Large Area ◽  
Helium Ion ◽  
Graphene Nanomesh

scholarly journals Self-Organized Conductive Gratings of Au Nanostripe Dimers Enable Tunable Plasmonic Activity

2020 ◽  
Vol 10 (4) ◽  
pp. 1301
Author(s):  
Maria Caterina Giordano ◽  
Matteo Barelli ◽  
Giuseppe Della Valle ◽  
Francesco Buatier de Mongeot
Keyword(s):  
High Efficiency ◽  
Ion Beam ◽  
Near Field ◽  
Cost Effective ◽  
Localized Surface Plasmon ◽  
Large Area ◽  
Field Amplification ◽  
Self Organized ◽  
Broadband Spectrum ◽  
Out Of Plane

Plasmonic metasurfaces based on quasi-one-dimensional (1D) nanostripe arrays are homogeneously prepared over large-area substrates (cm2), exploiting a novel self-organized nanofabrication method. Glass templates are nanopatterned by ion beam-induced anisotropic nanoscale wrinkling, enabling the maskless confinement of quasi-1D arrays of out-of-plane tilted gold nanostripes, behaving as transparent wire-grid polarizer nanoelectrodes. These templates enable the dichroic excitation of localized surface plasmon resonances, easily tunable over a broadband spectrum from the visible to the near- and mid-infrared, by tailoring the nanostripes’ shape and/or changing the illumination conditions. The controlled self-organized method allows the engineering of the nanoantennas’ morphology in the form of Au-SiO2-Au nanostripe dimers, which show hybridized plasmonic resonances with enhanced tunability. Under this condition, superior near-field amplification is achievable for the excitation of the hybridized magnetic dipole mode, as pointed out by numerical simulations. The high efficiency of these plasmonic nanoantennas, combined with the controlled tuning of the resonant response, opens a variety of applications for these cost-effective templates, ranging from biosensing and optical spectroscopies to high-resolution molecular imaging and nonlinear optics.

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